VAKSiS

VAKSiS is an OEM with her HQ located at the TECHNOPARK of the BILKENT UNIVERSITY in ANKARA – TURKEY. Within Turkey, VAKSIS is market leader and has built over 190 machines for multiple applications like PVD, CVD, RTP and Dry Etch. VAKSiS has shipped systems outside Turkey to countries like Spain, France, Germany, Finland, Great Britain and the Netherlands.

Solutions on Silicon BV is European distributor and service provider for VAKSIS systems.

 

VAKSiS Handy PVD series is convenient for use and easily handled as the adjective “handy” described in the dictionary.  This series can be used for deposition of Nitrides (Si3N4), Oxides (TiO2, SiO2), Semiconductors (a-Si:H(i), a-Si:H(n) a-Si:H(p)) and diamond-like Carbon (DLC). Chemical Vapor Deposition (CVD) is practiced in a variety of configurations in this platform.  

 

Technical Specifications




Vaksis CVD-HANDY TUBE SYSTEMS Low Pressure Chemical Vapor Deposition technology (LPCVD) is similar to other types of CVD where gaseous species reacts on a solid surface or wafer. The LPCVD process has a quartz tube co-axially placed in tube furnace. The main advantages of LPCVD are the excellent uniformity of thickness and purity, simple handling, homogeneity of deposited layers and high reproducibility.

This “CVD-handy tube” series is a high temperature CVD system, most successfully applied in deposition of graphene, carbon nanotubes and nanowires (ZnO, GeO).

Technical Specifications





Vaksis MiDAS COATING SYSTEMS series are composed of prismatic vacuum chambers and involve different techniques and combinations.

 

POWER SOURCES

o   DC and/or RF Power Supply for Sputtering Magnetron Source

o   Effusion Cell A.C. Power Supply for Metal and/or Organic Evaporation Sources

o   High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source

o   Power Supply for Electron Beam Evaporation Source

Technical Specifications

Vaksis Reactive-ion etching (RIE) system’s vacuum chamber geometry is in cylindrical shape. It uses chemically reactive plasma to remove material deposited on wafers. High-energy ions from the plasma attack the wafer surface and react with it. 

 

Technical Specifications




Vaksis RTAP HANDY TUBE SYSTEMS (Rapid Thermal Annealing) is particularly designed to heat samples at various linear and very high heating rates under vacuum and under low-pressure controlled atmosphere. RTAP process is done in a quartz tube coaxially placed in a heater assembly. The heating assembly utilizes “special-halogen-lamp-heating technique” in order to ramp up and cool down wafers.

Wafers can be heated in order to activate dopants, change film-to-film or film-to-wafer substrate interfaces, densify deposited films, change states of grown films, repair damage from ion implantation, move dopants or drive dopants from one film into another or from a film into the wafer substrate.

The same system can also be used in brazing applications to join different materials to each other without exposing them to deleterious oxygen atmosphere at high temperatures. 

Technical Specifications

 




Vaksis GünEr platform is composed of many vacuum chambers and a load lock chamber. This platform has a circular cluster structure and involves different techniques and combinations.

POWER SOURCES

o   DC and/or RF Power Supply for Sputtering Magnetron Source

o   Effusion Cell A.C. Power Supply for Metal and OLED Evaporation Sources

o   High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source

o   Power Supply for Electron Beam Evaporation Source

o   DC and/or RF Power Supply for Capacitively coupled plasma (CCP) or RF Power Supply for Inductively coupled plasma (ICP) Sources

Technical Specifications

Vaksis Multiple Star platform is composed of many vacuum chambers. This platform has a linear cluster structure and involves different techniques and combinations.

 

POWER SOURCES

o   DC and/or RF Power Supply for Sputtering Magnetron Source

o   Effusion Cell A.C. Power Supply for Metal and Organic Evaporation Sources

o   High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source

o   Power Supply for Electron Beam Evaporation Source

o   DC and/or RF Power Supply for Capacitively coupled plasma (CCP) or RF Power Supply for Inductively coupled plasma (ICP) Sources

Technical Specifications

Vaksis PETRoll platform is designed and manufactured for roll-to-roll (R2R) coatings and used for deposition on elastic surfaces.

 

POWER SOURCES

o   DC and/or RF Power Supply for Sputtering Magnetron Source

o   High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source

o   Effusion Cell A.C. Power Supply for Metal and Organic Evaporation Sources

o   Power Supply for Electron Beam Evaporation Source

Technical Specifications